Attributes for Mask Patterns - trillium_discovery - trillium_quality - Latest

Trillium Parser Tuner

Product type
Software
Portfolio
Verify
Product family
Trillium
Product
Trillium > Trillium Quality
Trillium > Trillium Discovery
Version
Latest
Language
English
Product name
Trillium Quality and Discovery
Title
Trillium Parser Tuner
Copyright
2024
First publish date
2008
Last updated
2024-10-18
Published on
2024-10-18T14:59:24.246276

The original and final mask patterns are written out in the mask attributes in the PREPOS (Parser Repository) area. The following table lists attributes for mask patterns.

Note: The ‘H’ attribute (‘_h_’) is used for the hankaku (half-width) fields.
Attribute Length Description

pr_mask_orig

pr_h_mask_orig

20

Original mask pattern, which is obtained just after the input string is separated into tokens (when contact separation is not used).

pr_mask_final

pr_h_mask_final

20

Final mask pattern, which is obtained after conversion by mask tables (when contact separation is not used).

pr_contact_mask_orig

pr_h_contact_mask_orig

20

Mask pattern obtained after the tokens are separated for contact name in the branch name attribute (when contact separation is used).

pr_contact_mask_final

pr_h_contact_mask_final

20

Mask pattern obtained after conversion by mask tables (when contact separation is used).

pr_mask_logic

pr_h_mask_logic

2

Status from the token separation by logic. See Customer Data Parser Attributes for Japan (JP) for values.