The original and final mask patterns are written out in the mask attributes in the PREPOS (Parser Repository) area. The following table lists attributes for mask patterns.
| Attribute | Length | Description |
|---|---|---|
|
pr_mask_orig pr_h_mask_orig |
20 |
Original mask pattern, which is obtained just after the input string is separated into tokens (when contact separation is not used). |
|
pr_mask_final pr_h_mask_final |
20 |
Final mask pattern, which is obtained after conversion by mask tables (when contact separation is not used). |
|
pr_contact_mask_orig pr_h_contact_mask_orig |
20 |
Mask pattern obtained after the tokens are separated for contact name in the branch name attribute (when contact separation is used). |
|
pr_contact_mask_final pr_h_contact_mask_final |
20 |
Mask pattern obtained after conversion by mask tables (when contact separation is used). |
|
pr_mask_logic pr_h_mask_logic |
2 |
Status from the token separation by logic. See Customer Data Parser Attributes for Japan (JP) for values. |